Chelsea Search Group
IC Layout Designer (TSMC FinFET)
Chelsea Search Group, Irvine, California, United States, 92713
IC Layout Designer
Full-time + Benefits
Remote from any US location
US Citizen or US Permanent Resident
Requirements :
• 3+ years of experience in Cadence layout (Virtuoso, VXL) and Calibre verification (ERC, DRC, LVS)
• 3+ years of experience in layout and verification tools and methodologies for RF/Analog/Mixed-Signal ICs
• BSEE or AA degree
• TSMC FinFET experience in advanced technology nodes (7nm and below)
• Comprehensive understanding of matching, shielding, guard rings and latch up
• Debugging and analytical skills with complex technical concepts
• Demonstrated success in delivering quality work product
• Experience in DFM hierarchical layout construction for efficient verification and integration
• Must understand techniques for managing layout dependent effects i.e. IR drop, RC delay, electron-migration, self- heating and crosstalk
• Proficiency in PERL or SKILL scripting is a plus
• Strong verbal and written communication
IC MASK LAYOUT DESIGN GROUP on LinkedIn: https://www.linkedin.com/groups/13537705/
Full-time + Benefits
Remote from any US location
US Citizen or US Permanent Resident
Requirements :
• 3+ years of experience in Cadence layout (Virtuoso, VXL) and Calibre verification (ERC, DRC, LVS)
• 3+ years of experience in layout and verification tools and methodologies for RF/Analog/Mixed-Signal ICs
• BSEE or AA degree
• TSMC FinFET experience in advanced technology nodes (7nm and below)
• Comprehensive understanding of matching, shielding, guard rings and latch up
• Debugging and analytical skills with complex technical concepts
• Demonstrated success in delivering quality work product
• Experience in DFM hierarchical layout construction for efficient verification and integration
• Must understand techniques for managing layout dependent effects i.e. IR drop, RC delay, electron-migration, self- heating and crosstalk
• Proficiency in PERL or SKILL scripting is a plus
• Strong verbal and written communication
IC MASK LAYOUT DESIGN GROUP on LinkedIn: https://www.linkedin.com/groups/13537705/